Software Engineer
Senior Lithography Application Engineer responsible for designing, developing, and supporting high‑throughput scanning probe microscopy systems for EUV lithography, driving yield improvements for leading chipmakers.
Nearfield Instruments (NFI) is a fast-growing scale-up high-tech company. We design, develop, integrate, market and service advanced metrology machines. Our machines enable our customers - the world’s leading chipmakers – to increase the production yields, and thus, functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics.
Founded in 2016, we bring together the most creative minds (approx. 320 employees) in science and technology and develop a one-of-a-kind, revolutionary high throughput Scanning Probe Microscopy system.
About the job
Senior application engineer in Lithography and Optical Imaging with a strong background in lithography, EUV, and scanner performance optimization. In this role, you will leverage your expertise in optical imaging and lithography physics to advance our metrology and process control solutions.
What will you be doing?
Develop and optimize optical imaging models and techniques for use in advanced metrology and inspection.
Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions.
Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure.
Advance methods such as scatterometry and computational imaging to push the limits of in-line process control.
Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems.
Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.
What do we require from you?
PhD or MSc in Physics, Optical Engineering, Electrical Engineering, or related field.
Deep expertise in optical imaging, EUV lithography, and scanner performance optimization.
Proven experience in EUV mask, scatterometry, and resist characterization.
Ability to bridge lithography knowledge with metrology and process control applications.
5+ years of industry or advanced academic research experience in semiconductor lithography, optical metrology, or related domains.
Strong analytical and problem-solving skills, with the ability to work across disciplines in a fast-paced R&D environment.
Originally posted on Himalayas
Posted June 20, 2026